Is this program accredited by the ACGME?
Yes, the program was visited and reaccredited by the ACGME in 2009.
How many applications are received, and how many are generally accepted?
Between 350 and 500 applications are reviewed each year. Approximately 30 candidates are invited for interviews.
What is the process for application review?
The Department of Dermatology participates in the National Resident Matching Program (NRMP), which provides the opportunity for both our Residency Training Program and applicants to consider all of the options in graduate medical education before making selection decisions. The Director of Residency Training Program reviews applications with the assistance of the faculty. Interested candidates should submit applications through the ERAS program by October 15.
What are the minimum requirements?
Applicants to the training program must plan on completing an accredited PGY-1 training program in internal medicine, pediatrics, surgery or family practice, or a transitional internship for a minimum of one year, and must have passed Step 1 of the United States Medical Licensing Examination (USMLE). There is no "cut off" score for the USMLE for the Department of Dermatology's residency program.
What are the minimum requirements prior to starting residency?
Trainees must pass Steps 2 and 3 of the United States Medical Licensing Examination (USMLE) prior to beginning Dermatology Residency at Johns Hopkins Dermatology (but not in order to apply or match).
Do you accept International Medical Graduates?
Yes, the Department of Dermatology considers this a component of its commitment to international education. The Office of International Services (OIS) for international Students, Faculty, and Staff maintains a helpful website with information for international applicants, including a visa information chart. Please note that the Department of Dermatology does not provide visas for trainees; rather, trainees apply to the United States Immigration Services to obtain the necessary forms and clearances.